Handbook of Chemical Vapor Depostion [i.e. Deposition] (CVD)
Hugh O. Pierson
Since the publication of the first edition of the Handbook of Chemical Vapor Deposition (CVD) in early 1992, the technology has developed at a rapid rate and the number and scope of its applications and their impact of the market have increased considerably. This process is now a key factor in many industries such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters and many others. The size of the CVD market today (1999) is estimated to be at least double that of the market seven years ago. This second edition of the Handbook is an update with a considerably expanded and revised scope.
الفئات:
عام:
1999
الناشر:
Noyes Publications
اللغة:
english
الصفحات:
482
ISBN 10:
0815514328
ISBN 13:
9780815514329
ملف:
PDF, 3.37 MB
IPFS:
,
english, 1999